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| Description: | Speaker Maria Farsari Affiliation IESL, FORTH, Greece Title Non-Linear Lithography: Principles, Materials and Applications Location Department of Physics Bldg., Voutes, 3rd floor Seminar Room Time 16:00 Language English Abstract NonLinear Lithography is a technique that allows the fabrication of three-dimensional structures with sub-100 nm resolution. It is based on multi-photon absorption; when the beam of an ultra-fast laser is tightly focused into the volume of a transparent, photosensitive material, polymerization can be initiated by non-linear absorption within the focal volume. By moving the laser focus three-dimensionally through the material, 3D structures can be fabricated. The technique has been implemented with a variety of materials and several components and devices have been fabricated such as photonic crystals, biomedical devices, and microscopic models. The unique capability of NonLinear Lithography lies in that it allows the fabrication of computer-designed, fully functional 3D devices. In this seminar we summarize the principles of microfabrication, and present our recent work in materials processing and functionalization of 3D structures. Finally, we discuss the future applications and prospects for the technology. |
| Status: | Waiting for approval |
| Date: | Friday, November 1, 2013 |
| Time: | 16:00 EET |
| Priority: | 5-Medium |
| Access: | Public |
| Created by: | Lila Kalogeraki |
| Updated: | Tuesday, October 29, 2013 13:20 GMT |